In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III–V Layers Using Reflection Anisotropy Spectroscopy

dc.contributor.author	Schmitt, Erica A.
dc.contributor.author	Guidat, Margot
dc.contributor.author	Flieg, Marco
dc.contributor.author	Diecke, Maximilian
dc.contributor.author	Euchner, Holger
dc.contributor.author	May, Matthias M.
dc.date.accessioned	2026-08-26T15:11:42Z
dc.date.available	2026-08-26T15:11:42Z
dc.date.issued	2026-07-31
dc.identifier.issn	1089-5639
dc.identifier.uri	http://hdl.handle.net/10900/182741
dc.language.iso	en	de_DE
dc.publisher	ACS Publications	de_DE
dc.relation.uri	https://doi.org/10.1021/acs.jpca.6c02573	de_DE
dc.subject	Elektrochemie	de_DE
dc.subject.ddc	050	de_DE
dc.title	In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III–V Layers Using Reflection Anisotropy Spectroscopy	de_DE
dc.type	Article	de_DE
utue.publikation.seiten	6465-6474	de_DE
utue.personen.roh	Schmitt, Erica A.
utue.personen.roh	Guidat, Margot
utue.personen.roh	Flieg, Marco
utue.personen.roh	Grutke, Jonas
utue.personen.roh	Diecke, Maximilian
utue.personen.roh	Möller, Kristof
utue.personen.roh	Euchner, Holger
utue.personen.roh	May, Matthias M.
dcterms.isPartOf.ZSTitelID	Journal of Physical Chemistry A	de_DE
dcterms.isPartOf.ZS-Issue	32	de_DE
dcterms.isPartOf.ZS-Volume	130	de_DE